Doping Engineering for Front-End Processing: Volume 1070

Paperback / softback

Main Details

Title Doping Engineering for Front-End Processing: Volume 1070
Authors and Contributors      Edited by B. J. Pawlak
Edited by M. L. Pelaz
Edited by M. Law
Edited by K. Surugo
SeriesMRS Proceedings
Physical Properties
Format:Paperback / softback
Pages:336
Dimensions(mm): Height 229,Width 152
Category/GenreMaterials science
ISBN/Barcode 9781107408548
ClassificationsDewey:620.112972
Audience
Postgraduate, Research & Scholarly
Professional & Vocational

Publishing Details

Publisher Cambridge University Press
Imprint Cambridge University Press
Publication Date 5 June 2014
Publication Country United Kingdom

Description

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.