Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606

Paperback / softback

Main Details

Title Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606
Authors and Contributors      Edited by Anthony C. Jones
Edited by Janice Veteran
Edited by Donald Mullin
Edited by Reid Cooper
Edited by Sanjeev Kaushal
SeriesMRS Proceedings
Physical Properties
Format:Paperback / softback
Pages:328
Dimensions(mm): Height 229,Width 152
Category/GenreMaterials science
ISBN/Barcode 9781107413207
ClassificationsDewey:620.1404297
Audience
Postgraduate, Research & Scholarly
Professional & Vocational

Publishing Details

Publisher Cambridge University Press
Imprint Cambridge University Press
Publication Date 5 June 2014
Publication Country United Kingdom

Description

This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..