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Properties and Processing of Vapor-Deposited Coatings: Volume 555

Paperback / softback

Main Details

Title Properties and Processing of Vapor-Deposited Coatings: Volume 555
Authors and Contributors      Edited by Roger N. Johnson
Edited by Woo Y. Lee
Edited by Michael A. Pickering
Edited by Brian W. Sheldon
SeriesMRS Proceedings
Physical Properties
Format:Paperback / softback
Pages:446
Dimensions(mm): Height 229,Width 152
Category/GenreMaterials science
ISBN/Barcode 9781107413917
ClassificationsDewey:620.11
Audience
Postgraduate, Research & Scholarly
Professional & Vocational

Publishing Details

Publisher Cambridge University Press
Imprint Cambridge University Press
Publication Date 5 June 2014
Publication Country United Kingdom

Description

This book focuses on advances associated with generating processing-microstructure-property-performance relationships of coatings produced by chemical vapor deposition (CVD) and physical vapor deposition (PVD) methods. Various coating materials and applications are discussed, ranging from producing high-quality diamond coatings to developing large-scale or novel diamond-like carbon (DLC) processes, understanding metal-ceramic interface adhesion behavior in thermal barrier coatings, identifying corrosion-resistant ceramic coating materials for high-temperature structural applications, and preparing polymeric thin films for integrated circuits. Rapid advances in industrial process scale-up and the development of a large-scale DLC coating chamber, based on a novel process concept called 'plasma ion immersion process,' is presented. Progress in understanding the reaction kinetics, particularly gas phase chemistry, of complex CVD processes is noted. Overall, the book clearly shows that vapor-deposited coatings are being actively pursued for diverse technological benefits, and that the coating community is increasingly relying on generating appropriate processing-microstructure-property relationships to guide integrated coating process and product development.