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Focused Ion Beam Systems: Basics and Applications

Hardback

Main Details

Title Focused Ion Beam Systems: Basics and Applications
Authors and Contributors      Edited by Nan Yao
Physical Properties
Format:Hardback
Pages:408
Dimensions(mm): Height 244,Width 170
Category/GenreNanotechnology
Materials science
Electronics engineering
ISBN/Barcode 9780521831994
ClassificationsDewey:621.38152
Audience
Professional & Vocational

Publishing Details

Publisher Cambridge University Press
Imprint Cambridge University Press
Publication Date 13 September 2007
Publication Country United Kingdom

Description

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

Author Biography

NAN YAO holds several positions at Princeton University, New Jersey. He is director of the Imaging and Analysis Center; Senior Research Scholar at the Institute for the Science and Technology of Materials; and a lecturer in Mechanical and Aerospace Engineering.